HASO EUV- New Generation Lithography Solution

HASO EUV- New Generation Lithography Solution

Spectral Bandwidth

30 - 300 eV (4 - 40 nm)

Aperture - Resolution - Spatial Sampling

13 x 13 mm - 272 x 72 - ~ 180 μm"

Focus dynamic range

± 0.5 m to ∞ / 0.013

Focus dynamic range

± 0.5 m to ∞

Repeatability (rms)

< λ/200

Minimum readout time

~600 ms (2 MHz digitization)

HASO EUV wavefront sensor, developed in collaboration with the LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today’s demanding laboratory and industrial applications.

Designed and built in collaboration with our customers and with their needs as the top priority, the HASO EUV incorporates our patented rotated square technology to offer high spatial sampling and wide dynamic range, making it the ideal choice for HHG, EUV lithography, synchrotron and EUV-FEL beam analysis. When used for adaptive optics, the EUV becomes a powerful tool for that provides you with micro and nano-beam focusing, a high Strehl ratio and precise control of the focal spot shape.
When combined with our powerful and easy-to-use software packages, you can easily conduct wavefront acquisition and reconstruction. Additional add-on modules offer features including extended wavefront reconstruction and Point Spread Function (PSF), as well as a dynamic library that enables you to build your own software applications using this remarkable device.

Click here for Frequently Asked Questions (FAQ)

Description

HASO EUV wavefront sensor, developed in collaboration with the LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today’s demanding laboratory and industrial applications.

Designed and built in collaboration with our customers and with their needs as the top priority, the HASO EUV wavefront sensor incorporates our patented rotated square technology to offer high spatial sampling and wide dynamic range, making it the ideal choice for HHG, EUV lithography, synchrotron and EUV-FEL beam analysis. When used for adaptive optics, the EUV becomes a powerful tool for that provides you with micro and nano-beam focusing, a high Strehl ratio and precise control of the focal spot shape.

When combined with our powerful and easy-to-use software packages, you can easily conduct wavefront acquisition and reconstruction. Additional add-on modules offer features including extended wavefront reconstruction and Point Spread Function (PSF), as well as a dynamic library that enables you to build your own software applications using this remarkable device.

HASO EUV wavefront sensor can also be used as a x-ray wavefront sensor. Please contact us for your application.

Click here for Frequently Asked Questions (FAQ)