HASO EUV- New Generation Lithography Solution

HASO EUV- New Generation Lithography Solution

Spectral Bandwidth

30 - 300 eV (4 - 40 nm)

Aperture - Resolution - Spatial Sampling

13 x 13 mm - 272 x 72 - ~ 180 μm"

Focus dynamic range

± 0.5 m to ∞ / 0.013

Focus dynamic range

± 0.5 m to ∞

Repeatability (rms)

< λ/200

Minimum readout time

~600 ms (2 MHz digitization)

Imagine Optic’s HASO EUV wavefront sensor, developed in collaboration with LOA laboratory and the SOLEIL synchrotron, is the only device of its kind that offers you the extreme precision and direct measurement functionality needed for today’s most demanding laboratory and industrial applications.

  • Synchrotron, EUV-FEL , and laser-driven secondary source alignment and characterization
  • Micro- and nano-focusing automatic alignment of EUV optical systems
  • Dense plasma diagnostics
  • Perfectly adapted for laboratory applications
  • Compatible to coherent and non-coherent sources
  • Usable for closed- and open-loop adaptive optics

Designed and built in collaboration with our customers to meet their needs as the top priority, the HASO EUV incorporates our patented rotated square technology to offer high resolution and wide dynamic range, making it the ideal choice for EUV lithography, gas or solid high-harmonic generation, synchrotron and EUV-FEL beam analysis. When used in combination with adaptive optics, the EUV wavefront sensor becomes a powerful tool that allows you to achieve with micro – and nano – focusing, high Strehl ratio and precise control of the focal spot shape.

Click here for Frequently Asked Questions (FAQ)

Description

HASO EUV wavefront sensor, developed in collaboration with the LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today’s demanding laboratory and industrial applications.

  • Synchrotron, EUV-FEL, and laser-driven secondary source alignment and characterization
  • Micro- and nano-focusing, automatic alignment of EUV optical systems
  • Dense plasma diagnostics
  • Perfectly adapted for laboratory applications
  • Compatible to coherent and non-coherent sources
  • Usable for closed- and open-loop adaptive optics

Designed and built in collaboration with our customers and with their needs as the top priority, the HASO EUV wavefront sensor incorporates our patented rotated square technology to offer high spatial sampling and wide dynamic range, making it the ideal choice for HHG, EUV lithography, synchrotron and EUV-FEL beam analysis. When used for adaptive optics, the EUV becomes a powerful tool for that provides you with micro and nano-beam focusing, a high Strehl ratio and precise control of the focal spot shape.

When combined with our powerful and easy-to-use software packages, you can easily conduct wavefront acquisition and reconstruction with the HASO EUV wavefront sensor. Additional add-on modules offer features including extended wavefront reconstruction and Point Spread Function (PSF), as well as a dynamic library that enables you to build your own software applications using this remarkable device.

WaveView is the most advanced wavefront measurement and analysis software. It offers more than 150 functions and tools optimized for a wide range of highly demanding applications. WaveView development philosophy is based on twenties of years of customer’s feedback, improving the user experience at each version. Modules dedicated to PSF, Strehl ratio, MTF, M² are available.

WaveKit is a SDK in C, LabVIEW and MATLAB, providing the basis blocks on which one can build a fully customized software for specific HASO based applications or WaveView data processing routines. WaveKit is available on request.

HASO EUV wavefront sensor can also be used as a x-ray wavefront sensor. Please contact us for your application.

Click here for Frequently Asked Questions (FAQ)

EUV Wavefront Sensor

 

 

 

 

For more wavefront sensors: https://axiomoptics.com/optical-metrology-system/